Submicron optical near-field diffraction patterns obtained by irradiation of octadecyltrimethoxysilane self-assembled monolayers with light at 157 nm

Nanostructures less than 200 nm in size are created by the Fresnel diffraction of 157 nm light at the aperture margins of a photomask through proximity irradiation of an octadecyltrimethoxysilane self-assembled monolayer. Photochemical decomposition of the organic monolayer creates complex nanostruc...

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Bibliographic Details
Published in:Thin solid films 2007-04, Vol.515 (12), p.5147-5152
Main Authors: Nae, F.A., Saito, N., Takai, O.
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Diffraction patterns
Exact sciences and technology
Fluorine laser
Materials science
Nanoscale materials and structures: fabrication and characterization
Other topics in nanoscale materials and structures
Physical radiation effects, radiation damage
Physics
Proximity lithography
Self-assembled monolayers
Structure of solids and liquids
crystallography
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Summary:Nanostructures less than 200 nm in size are created by the Fresnel diffraction of 157 nm light at the aperture margins of a photomask through proximity irradiation of an octadecyltrimethoxysilane self-assembled monolayer. Photochemical decomposition of the organic monolayer creates complex nanostructure patterns, according to the light intensity distribution at the substrate location. Dimensions and distribution of the nanostructures correlate well with the spatial distribution of the light intensity calculated using the Fresnel equations.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2006.10.090