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Crystallization kinetics of Ga–Sb–Te films for phase change memory
Ga–Sb–Te ternary thin films were prepared by co-sputtering using targets GaSb and Sb 8Te 2. Crystallization processes of these films were studied by measuring the temperature-dependent electrical resistance during non-isothermal heating. The activation energy ( E a), rate factor ( K o), and kinetics...
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Published in: | Thin solid films 2008-06, Vol.516 (16), p.5513-5517 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Ga–Sb–Te ternary thin films were prepared by co-sputtering using targets GaSb and Sb
8Te
2. Crystallization processes of these films were studied by measuring the temperature-dependent electrical resistance during non-isothermal heating. The activation energy (
E
a), rate factor (
K
o), and kinetics exponent (
n) were deduced from Kissinger and Ozawa's plots, respectively. The crystallization temperatures (
T
x
=
108∼319°C) increase with increasing GaSb contents. The activation energy (1.82∼7.52 eV) increases with increasing Ga content until 31.6 at.% then it decreases. The crystallization mechanisms of compositions A∼D (Ga
17∼32Sb
71∼62Te
12∼6), as evidenced from
n values, are nuclei formation and subsequent crystal growth; the nucleation rate decreases with grain growth. While composition E (Ga
38.2Sb
57.7Te
4.1) reveals an
n value lower than 1.5, it implies the one-dimensional crystal growth from the nuclei. The crystallization time of each composition was evaluated using JMA equation using all derived kinetics parameters. Composition C (Ga
26.4Sb
65.2Te
8.4), showing the shortest crystallization time, is suggested for phase change RAM applications. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2007.07.100 |