Large area VHF plasma production by a balanced power feeding method

We developed a VHF plasma source using a balanced power feeding method and investigated the characteristics of the VHF plasma with the Langmuir probe. It was found that the new VHF plasma source provides higher electron density plasma that is favorable for increasing the deposition rate of microcrys...

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Bibliographic Details
Published in:Thin solid films 2008-05, Vol.516 (13), p.4430-4434
Main Authors: Nishimiya, T., Takeuchi, Y., Yamauchi, Y., Takatsuka, H., Shioya, T., Muta, H., Kawai, Y.
Format: Article
Language:English
Subjects:
Electric and magnetic measurements
Electron temperature
Exact sciences and technology
Ion saturation current
Langmuir probe
Microcrystalline silicon
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma diagnostic techniques and instrumentation
Plasma heating by radiofrequency fields
icr, icp, helicons
Plasma production and heating
Plasma sources
Solar cell
VHF plasma
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Description
Summary:We developed a VHF plasma source using a balanced power feeding method and investigated the characteristics of the VHF plasma with the Langmuir probe. It was found that the new VHF plasma source provides higher electron density plasma that is favorable for increasing the deposition rate of microcrystalline silicon films.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2007.10.016