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Composition depth profile analysis of bulk heterojunction layer by time-of-flight secondary ion mass spectrometry with gradient shaving preparation

Composition depth profile analysis of bulk heterojunction (BHJ) layer was performed by time-of-flight secondary ion mass spectrometry with gradient shaving preparation. The BHJ layer comprised of poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl-C61butyric acid methyl ester (PCBM) was formed on the sub...

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Bibliographic Details
Published in:Thin solid films 2010-02, Vol.518 (8), p.2115-2118
Main Authors: Yamamoto, Shuhei, Kitazawa, Daisuke, Tsukamoto, Jun, Shibamori, Takahiro, Seki, Hirofumi, Nakagawa, Yoshitsugu
Format: Article
Language:English
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Summary:Composition depth profile analysis of bulk heterojunction (BHJ) layer was performed by time-of-flight secondary ion mass spectrometry with gradient shaving preparation. The BHJ layer comprised of poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl-C61butyric acid methyl ester (PCBM) was formed on the substrate coated with poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) followed by annealing. The P3HT component increased toward the top surface in the BHJ layer. In addition, C 8H 7SO 3 − was detected inside the BHJ layer, suggesting penetration of PSS. P3HT was uniformly distributed in the BHJ layer without PEDOT:PSS. The P3HT-rich distribution in the top surface may be attributed to PSS penetration.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2009.07.121