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Growth ambient dependent electrical properties of lithium and nitrogen dual-doped ZnO films prepared by radio-frequency magnetron sputtering

Lithium (Li) and nitrogen (N) dual-doped ZnO films with wurtzite structure were prepared by radio-frequency magnetron sputtering ZnO target with Li 3N in growth ambient of pure Ar and the mixture of Ar and O 2, respectively, and then post annealing techniques. The film showed week p-type conductivit...

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Bibliographic Details
Published in:Thin solid films 2010-04, Vol.518 (12), p.3289-3292
Main Authors: Zhao, T.T., Yang, T., Yao, B., Cong, C.X., Sui, Y.R., Xing, G.Z., Sun, Y., Su, S.C., Zhu, H., Shen, D.Z.
Format: Article
Language:English
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Summary:Lithium (Li) and nitrogen (N) dual-doped ZnO films with wurtzite structure were prepared by radio-frequency magnetron sputtering ZnO target with Li 3N in growth ambient of pure Ar and the mixture of Ar and O 2, respectively, and then post annealing techniques. The film showed week p-type conductivity as the ambient was pure Ar, but stable p-type conductivity with a hole concentration of 3.46 × 10 17 cm − 3 , Hall mobility of 5.27 cm 2/Vs and resistivity of 3.43 Ω cm when the ambient is the mixture of Ar and O 2 with the molar ratio of 60:1. The stable p-type conductivity is due to substitution of Li for Zn (Li Zn) and formation of complex of interstitial Li (Li i) and substitutional N at O site, the former forms a Li Zn acceptor, and the latter depresses compensation of Li i donor for Li Zn acceptor. The level of the Li Zn acceptor is estimated to be 131.6 meV by using temperature-dependent photoluminescence spectrum measurement and Haynes rule. Mechanism about the effect of the ambient on the conductivity is discussed in the present work.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2009.09.008