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Growth ambient dependent electrical properties of lithium and nitrogen dual-doped ZnO films prepared by radio-frequency magnetron sputtering
Lithium (Li) and nitrogen (N) dual-doped ZnO films with wurtzite structure were prepared by radio-frequency magnetron sputtering ZnO target with Li 3N in growth ambient of pure Ar and the mixture of Ar and O 2, respectively, and then post annealing techniques. The film showed week p-type conductivit...
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Published in: | Thin solid films 2010-04, Vol.518 (12), p.3289-3292 |
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Main Authors: | , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Lithium (Li) and nitrogen (N) dual-doped ZnO films with wurtzite structure were prepared by radio-frequency magnetron sputtering ZnO target with Li
3N in growth ambient of pure Ar and the mixture of Ar and O
2, respectively, and then post annealing techniques. The film showed week p-type conductivity as the ambient was pure Ar, but stable p-type conductivity with a hole concentration of 3.46
×
10
17
cm
−
3
, Hall mobility of 5.27
cm
2/Vs and resistivity of 3.43
Ω cm when the ambient is the mixture of Ar and O
2 with the molar ratio of 60:1. The stable p-type conductivity is due to substitution of Li for Zn (Li
Zn) and formation of complex of interstitial Li (Li
i) and substitutional N at O site, the former forms a Li
Zn acceptor, and the latter depresses compensation of Li
i donor for Li
Zn acceptor. The level of the Li
Zn acceptor is estimated to be 131.6
meV by using temperature-dependent photoluminescence spectrum measurement and Haynes rule. Mechanism about the effect of the ambient on the conductivity is discussed in the present work. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2009.09.008 |