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Anatase–rutile transformation through high-temperature annealing of titania films produced by ultrasonic spray pyrolysis

Titanium dioxide films were prepared by ultrasonic spray pyrolysis on (0001) α-quartz substrates at 400 °C and/or annealed in air at 600°, 800°, or 1000 °C. The as-deposited films at 400 °C (50 nm grains) and annealed at 600 °C (100 nm grains) showed single-phase anatase of high transparency in the...

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Bibliographic Details
Published in:Thin solid films 2010-05, Vol.518 (14), p.3735-3742
Main Authors: Nakaruk, A., Ragazzon, D., Sorrell, C.C.
Format: Article
Language:English
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Summary:Titanium dioxide films were prepared by ultrasonic spray pyrolysis on (0001) α-quartz substrates at 400 °C and/or annealed in air at 600°, 800°, or 1000 °C. The as-deposited films at 400 °C (50 nm grains) and annealed at 600 °C (100 nm grains) showed single-phase anatase of high transparency in the visible region. Films annealed at 800 °C and 1000 °C showed mixed-phase anatase (100 nm grains) plus rutile (700 nm agglomerates) and pure rutile, (700 nm grains), respectively. Raman and X-ray data indicate the presence of residual stress in the films, which may arise from contamination, silicon diffusion into the films, and/or oxygen deficiency.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2009.10.109