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Anatase–rutile transformation through high-temperature annealing of titania films produced by ultrasonic spray pyrolysis
Titanium dioxide films were prepared by ultrasonic spray pyrolysis on (0001) α-quartz substrates at 400 °C and/or annealed in air at 600°, 800°, or 1000 °C. The as-deposited films at 400 °C (50 nm grains) and annealed at 600 °C (100 nm grains) showed single-phase anatase of high transparency in the...
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Published in: | Thin solid films 2010-05, Vol.518 (14), p.3735-3742 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Titanium dioxide films were prepared by ultrasonic spray pyrolysis on (0001)
α-quartz substrates at 400
°C and/or annealed in air at 600°, 800°, or 1000
°C. The as-deposited films at 400
°C (50
nm grains) and annealed at 600
°C (100
nm grains) showed single-phase anatase of high transparency in the visible region. Films annealed at 800
°C and 1000
°C showed mixed-phase anatase (100
nm grains) plus rutile (700
nm agglomerates) and pure rutile, (700
nm grains), respectively. Raman and X-ray data indicate the presence of residual stress in the films, which may arise from contamination, silicon diffusion into the films, and/or oxygen deficiency. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2009.10.109 |