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Electrical characterization of high-k gate dielectrics on Ge with HfGeN and GeO2 interlayers

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Bibliographic Details
Published in:	Thin solid films 2010-02, Vol.518 (9), p.2505-2508
Main Authors:	HIRAYAMA, Kana, KIRA, Wataru, YOSHINO, Keisuke, HAIGUI YANG, DONG WANG, NAKASHIMA, Hiroshi
Format:	Article
Language:	English
Subjects:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport phenomena in thin films and low-dimensional structures Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physical radiation effects, radiation damage Physics Structure of solids and liquids crystallography Surface and interface electron states
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