Thin functional films by combustion chemical vapour deposition (C-CVD)

The use of the atmospheric pressure C-CVD (combustion chemical vapour deposition) process for the deposition of thin functional layers on float glass and plastics is described. We will give an overview on the variety of materials that can be deposited and some examples, like SiO2, WOx and Ag, are pr...

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Bibliographic Details
Published in:Thin solid films 2012-04, Vol.520 (12), p.4106-4109
Main Authors: Struppert, Thomas, Heft, Andreas, Grünler, Bernd
Format: Article
Language:English
Subjects:
Atmospheric pressure
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Combustion CVD
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Oxides
Physics
Structure and morphology
thickness
Surface functionalization
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
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Description
Summary:The use of the atmospheric pressure C-CVD (combustion chemical vapour deposition) process for the deposition of thin functional layers on float glass and plastics is described. We will give an overview on the variety of materials that can be deposited and some examples, like SiO2, WOx and Ag, are presented in more detail with potential applications.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2011.06.048