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Radio frequency-H 2 O plasma treatment on indium tin oxide films produced by electron beam and radio frequency magnetron sputtering methods
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Published in: | Thin solid films 2014-09, Vol.567, p.32-37 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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ISSN: | 0040-6090 |
DOI: | 10.1016/j.tsf.2014.07.035 |