ZnO/Zn and ZnO film deposited via microwave atmospheric plasma jet as photo-catalyst for Rhodamine 6G dye degradation

ZnO/Zn film was deposited on soda-lime glass substrate using a microwave atmospheric plasma jet. Energy dispersive spectroscopy showed that the Zn and O2 has an atomic ratio of 72:28. Zn (101) peak was also observed through X-ray Diffraction analysis. Annealing of the ZnO/Zn film at 400°C for 1h lea...

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 2017-02, Vol.624, p.197-200
Main Authors: Tinacba, Erin Joy C., Nuñez, Julius Andrew, Tumlos, Roy B., Ramos, Henry J.
Format: Article
Language:English
Subjects:
Microwave atmospheric plasma jet
Photocatalytic property
Plasma applications
Thin films
Zinc
Zinc oxide
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:ZnO/Zn film was deposited on soda-lime glass substrate using a microwave atmospheric plasma jet. Energy dispersive spectroscopy showed that the Zn and O2 has an atomic ratio of 72:28. Zn (101) peak was also observed through X-ray Diffraction analysis. Annealing of the ZnO/Zn film at 400°C for 1h leads to the oxidation of Zn forming ZnO film. The photo-catalytic properties of the ZnO/Zn and ZnO films for the degradation of Rhodamine 6G dye were then compared. ZnO/Zn film has higher degradation rate of 1.37%/min while ZnO film has 1.23%/min. •Microwave atmospheric plasma jet was used to deposit ZnO/Zn and ZnO films.•Both films can effectively photodegrade Rhodamine 6G dye solution.•ZnO/Zn film has faster degradation rate.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2016.07.018