Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering

N-containing titanium dioxide (N-TiO2) thin films have been obtained by the midrange magnetron sputtering with two-component N2/O2 reactive working gas. Complex analysis of the films structure and phase composition demonstrates its significant changes due to nitrogen content. X-ray diffraction data...

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Bibliographic Details
Published in:Thin solid films 2017-04, Vol.627, p.9-16
Main Authors: Pustovalova, Alla A., Pichugin, Vladimir F., Ivanova, Nina M., Bruns, Michael
Format: Article
Language:English
Subjects:
Magnetron sputtering
Nitrogen addition
Structure
Thin films
Titanium dioxide
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Summary:N-containing titanium dioxide (N-TiO2) thin films have been obtained by the midrange magnetron sputtering with two-component N2/O2 reactive working gas. Complex analysis of the films structure and phase composition demonstrates its significant changes due to nitrogen content. X-ray diffraction data show the anatase-rutile phase transition and crystallites size reduction in N-TiO2 thin films with increase of nitrogen content in the reactive atmosphere. The investigation has been focused on phase transition, zeta potential, chemical bonds and UV-light influence on the wettability of the films versus nitrogen concentration. Hydrophilization of N-TiO2 films surface under UV-light has an irreversible character. •N-TiO2 films were obtained with different nitrogen content in magnetron plasma.•Preferential rutile formation is due to the nitrogen increase in plasma.•Structural elements refinement takes place with the nitrogen increase in plasma.•Modified Structure Zone Model was developed on the basis of nitrogen location.•Ultraviolet radiation results in weak hydrophilization of the film surface.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2017.02.056