The effect of the deposition rate on microstructural and opto-electronic properties of β-Sn layers

Microstructural and opto-electronic properties of thin films strongly depend on the deposition conditions (e.g. temperature, deposition rate). The 30 nm tin (Sn) layers were prepared using the physical vapor deposition technique. The tin layers were deposited on the Al2O3 - coated Si substrates at f...

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Bibliographic Details
Published in:Thin solid films 2019-01, Vol.670, p.86-92
Main Authors: Rerek, T., Skowronski, L., Szczesny, R., Naparty, M.K., Derkowska-Zielinska, B.
Format: Article
Language:English
Subjects:
Ellipsometry
Microstructure
Optical property
Tin, thin films
Topography
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Summary:Microstructural and opto-electronic properties of thin films strongly depend on the deposition conditions (e.g. temperature, deposition rate). The 30 nm tin (Sn) layers were prepared using the physical vapor deposition technique. The tin layers were deposited on the Al2O3 - coated Si substrates at five different deposition rates in the range from 0.05 Å/s up to 5.00 Å/s. The influence of the deposition rate on the microstructure of the surface was investigated using atomic force microscope and scanning electron microscope. Changes in the microstructure of the Sn layers cause variations in its opto-electronic properties. These features were examined using spectroscopic ellipsometry measurements. •The 30 nm layer of β-Sn were formed using thermal evaporation.•Microstructure of Sn films strongly depend on the deposition rate.•The Sn films exhibit strong texture.•The optical resistivity of Sn films depends of the deposition rate.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2018.12.009