Effect of electron injection on the parameters of a pulsed planar magnetron

• Published in: Vacuum 2019-01, Vol.159, p.200-203
• Main Authors: Shandrikov, Maxim V., Bugaev, Alexey S., Oks, Efim M., Ostanin, Alexander G., Vizir, Alexey V., Yushkov, Georgy Yu
• Format: Article
• Language: English
• Subjects: Electron injection; Hollow cathode; Ion current; Magnetron discharge; Target
• ISSN: 0042-207X; 1879-2715
• DOI: 10.1016/j.vacuum.2018.10.042

We have explored the influence of supplementary electron injection on the operational parameters of a planar magnetron operating in repetitively pulsed mode (repetition rate 300 Hz, pulse duration 50–100 μs). The supplementary electron flux was provided from the plasma of an auxiliary hollow-cathode glow discharge and was accelerated directly into the magnetron cathode layer. We show that this supplementary electron injection eliminates magnetron ignition delay and increases the sputtered ion current from the magnetron plasma. •We have explored the influence of supplementary peripheral electron injection on the operational parameters of a planar magnetron operating in repetitively pulsed mode.•Electrons from the auxiliary hollow cathode discharge injected in the cathode layer of the magnetron discharge to an energy sufficient for effective gas ionization and formation of dense plasma near the sputter target.•It was shown that electron injection into the cathode layer of a pulsed magnetron discharge eliminates the ignition delay of the discharge and increases the magnetron current by about ten times the auxiliary current.•Electron injection also provides at least a twofold increase in the ion current to a collector located 15 cm from the target.