Simultaneous Co-localized TiO 2 Etching and W Atomic Layer Deposition Using WF 6 as a Dual-Functional Reactant

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Bibliographic Details
Published in:Chemistry of materials 2024-10, Vol.36 (19), p.9677-9685
Main Authors: Margavio, Hannah R. M., Arellano, Noel, Singh, Ishwar, Wojtecki, Rudy, Parsons, Gregory N.
Format: Article
Language:English
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ISSN:0897-4756
1520-5002
DOI:10.1021/acs.chemmater.4c01773