Atomic Layer Deposition-Derived Nanomaterials: Oxides, Transition Metal Dichalcogenides, and Metal–Organic Frameworks

• Published in: Chemistry of materials 2020-11, Vol.32 (21), p.9056-9077
• Main Authors: Zhang, Zhiwei, Zhao, Yuting, Zhao, Zhe, Huang, Gaoshan, Mei, Yongfeng
• Format: Article
• Language: English
• ISSN: 0897-4756; 1520-5002
• DOI: 10.1021/acs.chemmater.9b04414

Atomic layer deposition (ALD) is an effective technique of preparing nanomembranes with atomic scaling precision, high uniformity, superior conformality, and excellent accessibility on different substrates. Recently, some emerging methods have been derived to prepare nanomaterials that cannot be prepared directly by conventional ALD. For instance, ALD lift-off is an efficient method for preparing free-standing oxides nanostructures with precise size and controllable dimensions. The confinement from the substrate can thus be eliminated, and the corresponding device can be obtained via a micro/nano-fabrication process. ALD induced growth is a strategy of inducing chemical reactions on an ALD predeposited thin film through the post-treatment including vapor phase treatment or liquid phase treatment to prepare new materials and has been adopted in the synthesis of transition metal dichalcogenides and metal organic frameworks. In these perspectives, these ALD-derived technologies and newly developed materials can bring opportunities for the future advantageous applications. Here in this review we provide a comprehensive conclusion and understanding of these ALD-derived techniques and related promising nanomaterials.