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Study of the Coupling Effect of Multiple Factors on the Photoreaction Process Based on a Standard Photoreactor

Accurate, stable, and reproducible photocatalytic reaction systems remain a major challenge when performing photocatalytic mechanism studies. In this paper, we designed and built a standard photocatalytic reactor to realize the precise adjustment of each parameter related to the photoreaction to mee...

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Bibliographic Details
Published in:Industrial & engineering chemistry research 2023-07, Vol.62 (26), p.10266-10276
Main Authors: An, Jintao, Lv, Qianrui, Wang, Yuchao, Yang, Wenbo, Tao, Shengyang, Zhang, Lijing, Miskevich, Alexander A., Loiko, Valery A.
Format: Article
Language:English
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Summary:Accurate, stable, and reproducible photocatalytic reaction systems remain a major challenge when performing photocatalytic mechanism studies. In this paper, we designed and built a standard photocatalytic reactor to realize the precise adjustment of each parameter related to the photoreaction to meet the demand for the accurate study of photochemical reaction mechanisms and can realize the personalized settings for different photochemical reactions. Based on this standard reactor, the influence of each independent parameter on the conversion rate of the reaction was studied based on the model reaction of 9,10-diphenylanthracene oxidation, and a mathematical model of the coupling influence of multiple factors to the photochemical reaction was obtained using the dimensionless data processing method. The mathematical model can help to carry out the coordinated selection of various parameters of photochemical reactions, reduce the reaction cost, and improve the reaction efficiency. Furthermore, we demonstrate the simplicity and accuracy of this reactor in measuring and calculating the quantum efficiency of photochemical reactions. This work is of great guidance to exploring the basic principles of photochemical reactions, the selection of reaction parameters, and the construction of photochemical reactors.
ISSN:0888-5885
1520-5045
DOI:10.1021/acs.iecr.3c00842