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Mg-Doping of (111)B GaAs Thin Films Grown by Molecular Beam Epitaxy

In this work, the influence of the growth conditions in the incorporation of Mg p-type dopant atoms in epitaxial GaAs(100) and (111)B thin films was investigated. Hall effect measurements and photoluminescence spectroscopy were used to investigate the electrical and optical properties of the films,...

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Published in:Journal of physical chemistry. C 2019-05, Vol.123 (20), p.12807-12812
Main Authors: Limborço, H, Matinaga, F. M, da Silva, M. I. N, de Melo, O, Viana, E. R, Leitão, J. P, Moreira, M. V. B, Ribeiro, G. M, de Oliveira, A. G, González, J. C
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container_end_page 12812
container_issue 20
container_start_page 12807
container_title Journal of physical chemistry. C
container_volume 123
creator Limborço, H
Matinaga, F. M
da Silva, M. I. N
de Melo, O
Viana, E. R
Leitão, J. P
Moreira, M. V. B
Ribeiro, G. M
de Oliveira, A. G
González, J. C
description In this work, the influence of the growth conditions in the incorporation of Mg p-type dopant atoms in epitaxial GaAs(100) and (111)B thin films was investigated. Hall effect measurements and photoluminescence spectroscopy were used to investigate the electrical and optical properties of the films, respectively. The doping level varied between 1016 and 1019 cm–3 and increased with the inverse of the growth temperature and with the temperature of the Mg evaporation cell, with similar behavior in both crystal orientations. The analysis of the Mg incorporation at several growth temperatures and Mg arrival rates established a value of E d (111)B = 1.6 ± 0.1 eV for the thermal desorption activation energy of Mg in the GaAs(111)­B, a value 33% higher than for the (100) case. However, when a more realistic incomplete ionization model for the acceptors is considered, the value of the thermal activation energy for desorption of Mg adatoms increases to 2.7 ± 0.8 eV and equals the value for the (100) surface. Two very close broad bands were observed in the PL emission of the samples: free electron-to-Mg acceptor level (e–A) transition, at approximately 1.49 eV, and the donor-to-Mg acceptor (D–A) transition, at approximately 1.48 eV. However, a relative small red shift and broadening of these optical transitions for the (111)B samples suggest that this orientation is less susceptible to many-body interaction as the doping level increases, and Mg acceptors get close enough to interact. The small increase of the full width at half-maximum with the doping level for both transitions also indicates that the crystalline quality of the GaAs(111)B thin films was not severely perturbed by the high doping levels studied in this work.
doi_str_mv 10.1021/acs.jpcc.9b01668
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fullrecord <record><control><sourceid>acs_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1021_acs_jpcc_9b01668</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>d236073980</sourcerecordid><originalsourceid>FETCH-LOGICAL-a148t-fe99d53eaf7cdd38fc04122ffff6b76643e574c04fd7e7fa2aa1f40a4f5f43073</originalsourceid><addsrcrecordid>eNp1kM1PwzAMxSMEEmNw55gjSLTETdq0x61sBWkTl3Gu3DQZnfqlZBP0v6djEzd8eZbt92T9CLkH5gML4BmV83e9Un5SMIii-IJMIOGBJ0UYXv71Ql6TG-d2jIWcAZ-QdL31Xrq-are0M_QBAB7nNMOZo5vPqqXLqm4czWz31dJioOuu1upQo6VzjQ1d9NUev4dbcmWwdvrurFPysVxs0ldv9Z69pbOVhyDivWd0kpQh12ikKkseG8UEBIEZKypkFAmuQynGoSmllgYDRDCCoTChEZxJPiXslKts55zVJu9t1aAdcmD5EUI-QsiPEPIzhNHydLL8brqDbccH_z__AdIcXuw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Mg-Doping of (111)B GaAs Thin Films Grown by Molecular Beam Epitaxy</title><source>American Chemical Society:Jisc Collections:American Chemical Society Read &amp; Publish Agreement 2022-2024 (Reading list)</source><creator>Limborço, H ; Matinaga, F. M ; da Silva, M. I. N ; de Melo, O ; Viana, E. R ; Leitão, J. P ; Moreira, M. V. B ; Ribeiro, G. M ; de Oliveira, A. G ; González, J. C</creator><creatorcontrib>Limborço, H ; Matinaga, F. M ; da Silva, M. I. N ; de Melo, O ; Viana, E. R ; Leitão, J. P ; Moreira, M. V. B ; Ribeiro, G. M ; de Oliveira, A. G ; González, J. C</creatorcontrib><description>In this work, the influence of the growth conditions in the incorporation of Mg p-type dopant atoms in epitaxial GaAs(100) and (111)B thin films was investigated. Hall effect measurements and photoluminescence spectroscopy were used to investigate the electrical and optical properties of the films, respectively. The doping level varied between 1016 and 1019 cm–3 and increased with the inverse of the growth temperature and with the temperature of the Mg evaporation cell, with similar behavior in both crystal orientations. The analysis of the Mg incorporation at several growth temperatures and Mg arrival rates established a value of E d (111)B = 1.6 ± 0.1 eV for the thermal desorption activation energy of Mg in the GaAs(111)­B, a value 33% higher than for the (100) case. However, when a more realistic incomplete ionization model for the acceptors is considered, the value of the thermal activation energy for desorption of Mg adatoms increases to 2.7 ± 0.8 eV and equals the value for the (100) surface. Two very close broad bands were observed in the PL emission of the samples: free electron-to-Mg acceptor level (e–A) transition, at approximately 1.49 eV, and the donor-to-Mg acceptor (D–A) transition, at approximately 1.48 eV. However, a relative small red shift and broadening of these optical transitions for the (111)B samples suggest that this orientation is less susceptible to many-body interaction as the doping level increases, and Mg acceptors get close enough to interact. The small increase of the full width at half-maximum with the doping level for both transitions also indicates that the crystalline quality of the GaAs(111)B thin films was not severely perturbed by the high doping levels studied in this work.</description><identifier>ISSN: 1932-7447</identifier><identifier>EISSN: 1932-7455</identifier><identifier>DOI: 10.1021/acs.jpcc.9b01668</identifier><language>eng</language><publisher>American Chemical Society</publisher><ispartof>Journal of physical chemistry. C, 2019-05, Vol.123 (20), p.12807-12812</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-a148t-fe99d53eaf7cdd38fc04122ffff6b76643e574c04fd7e7fa2aa1f40a4f5f43073</cites><orcidid>0000-0001-8131-3313 ; 0000-0001-9155-1657 ; 0000-0002-1883-3508</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Limborço, H</creatorcontrib><creatorcontrib>Matinaga, F. M</creatorcontrib><creatorcontrib>da Silva, M. I. N</creatorcontrib><creatorcontrib>de Melo, O</creatorcontrib><creatorcontrib>Viana, E. R</creatorcontrib><creatorcontrib>Leitão, J. P</creatorcontrib><creatorcontrib>Moreira, M. V. B</creatorcontrib><creatorcontrib>Ribeiro, G. M</creatorcontrib><creatorcontrib>de Oliveira, A. G</creatorcontrib><creatorcontrib>González, J. C</creatorcontrib><title>Mg-Doping of (111)B GaAs Thin Films Grown by Molecular Beam Epitaxy</title><title>Journal of physical chemistry. C</title><addtitle>J. Phys. Chem. C</addtitle><description>In this work, the influence of the growth conditions in the incorporation of Mg p-type dopant atoms in epitaxial GaAs(100) and (111)B thin films was investigated. Hall effect measurements and photoluminescence spectroscopy were used to investigate the electrical and optical properties of the films, respectively. The doping level varied between 1016 and 1019 cm–3 and increased with the inverse of the growth temperature and with the temperature of the Mg evaporation cell, with similar behavior in both crystal orientations. The analysis of the Mg incorporation at several growth temperatures and Mg arrival rates established a value of E d (111)B = 1.6 ± 0.1 eV for the thermal desorption activation energy of Mg in the GaAs(111)­B, a value 33% higher than for the (100) case. However, when a more realistic incomplete ionization model for the acceptors is considered, the value of the thermal activation energy for desorption of Mg adatoms increases to 2.7 ± 0.8 eV and equals the value for the (100) surface. Two very close broad bands were observed in the PL emission of the samples: free electron-to-Mg acceptor level (e–A) transition, at approximately 1.49 eV, and the donor-to-Mg acceptor (D–A) transition, at approximately 1.48 eV. However, a relative small red shift and broadening of these optical transitions for the (111)B samples suggest that this orientation is less susceptible to many-body interaction as the doping level increases, and Mg acceptors get close enough to interact. The small increase of the full width at half-maximum with the doping level for both transitions also indicates that the crystalline quality of the GaAs(111)B thin films was not severely perturbed by the high doping levels studied in this work.</description><issn>1932-7447</issn><issn>1932-7455</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNp1kM1PwzAMxSMEEmNw55gjSLTETdq0x61sBWkTl3Gu3DQZnfqlZBP0v6djEzd8eZbt92T9CLkH5gML4BmV83e9Un5SMIii-IJMIOGBJ0UYXv71Ql6TG-d2jIWcAZ-QdL31Xrq-are0M_QBAB7nNMOZo5vPqqXLqm4czWz31dJioOuu1upQo6VzjQ1d9NUev4dbcmWwdvrurFPysVxs0ldv9Z69pbOVhyDivWd0kpQh12ikKkseG8UEBIEZKypkFAmuQynGoSmllgYDRDCCoTChEZxJPiXslKts55zVJu9t1aAdcmD5EUI-QsiPEPIzhNHydLL8brqDbccH_z__AdIcXuw</recordid><startdate>20190523</startdate><enddate>20190523</enddate><creator>Limborço, H</creator><creator>Matinaga, F. M</creator><creator>da Silva, M. I. N</creator><creator>de Melo, O</creator><creator>Viana, E. R</creator><creator>Leitão, J. P</creator><creator>Moreira, M. V. B</creator><creator>Ribeiro, G. M</creator><creator>de Oliveira, A. G</creator><creator>González, J. C</creator><general>American Chemical Society</general><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0001-8131-3313</orcidid><orcidid>https://orcid.org/0000-0001-9155-1657</orcidid><orcidid>https://orcid.org/0000-0002-1883-3508</orcidid></search><sort><creationdate>20190523</creationdate><title>Mg-Doping of (111)B GaAs Thin Films Grown by Molecular Beam Epitaxy</title><author>Limborço, H ; Matinaga, F. M ; da Silva, M. I. N ; de Melo, O ; Viana, E. R ; Leitão, J. P ; Moreira, M. V. B ; Ribeiro, G. M ; de Oliveira, A. G ; González, J. C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a148t-fe99d53eaf7cdd38fc04122ffff6b76643e574c04fd7e7fa2aa1f40a4f5f43073</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Limborço, H</creatorcontrib><creatorcontrib>Matinaga, F. M</creatorcontrib><creatorcontrib>da Silva, M. I. N</creatorcontrib><creatorcontrib>de Melo, O</creatorcontrib><creatorcontrib>Viana, E. R</creatorcontrib><creatorcontrib>Leitão, J. P</creatorcontrib><creatorcontrib>Moreira, M. V. B</creatorcontrib><creatorcontrib>Ribeiro, G. M</creatorcontrib><creatorcontrib>de Oliveira, A. G</creatorcontrib><creatorcontrib>González, J. C</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of physical chemistry. C</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Limborço, H</au><au>Matinaga, F. M</au><au>da Silva, M. I. N</au><au>de Melo, O</au><au>Viana, E. R</au><au>Leitão, J. P</au><au>Moreira, M. V. B</au><au>Ribeiro, G. M</au><au>de Oliveira, A. G</au><au>González, J. C</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Mg-Doping of (111)B GaAs Thin Films Grown by Molecular Beam Epitaxy</atitle><jtitle>Journal of physical chemistry. C</jtitle><addtitle>J. Phys. Chem. C</addtitle><date>2019-05-23</date><risdate>2019</risdate><volume>123</volume><issue>20</issue><spage>12807</spage><epage>12812</epage><pages>12807-12812</pages><issn>1932-7447</issn><eissn>1932-7455</eissn><abstract>In this work, the influence of the growth conditions in the incorporation of Mg p-type dopant atoms in epitaxial GaAs(100) and (111)B thin films was investigated. Hall effect measurements and photoluminescence spectroscopy were used to investigate the electrical and optical properties of the films, respectively. The doping level varied between 1016 and 1019 cm–3 and increased with the inverse of the growth temperature and with the temperature of the Mg evaporation cell, with similar behavior in both crystal orientations. The analysis of the Mg incorporation at several growth temperatures and Mg arrival rates established a value of E d (111)B = 1.6 ± 0.1 eV for the thermal desorption activation energy of Mg in the GaAs(111)­B, a value 33% higher than for the (100) case. However, when a more realistic incomplete ionization model for the acceptors is considered, the value of the thermal activation energy for desorption of Mg adatoms increases to 2.7 ± 0.8 eV and equals the value for the (100) surface. Two very close broad bands were observed in the PL emission of the samples: free electron-to-Mg acceptor level (e–A) transition, at approximately 1.49 eV, and the donor-to-Mg acceptor (D–A) transition, at approximately 1.48 eV. However, a relative small red shift and broadening of these optical transitions for the (111)B samples suggest that this orientation is less susceptible to many-body interaction as the doping level increases, and Mg acceptors get close enough to interact. The small increase of the full width at half-maximum with the doping level for both transitions also indicates that the crystalline quality of the GaAs(111)B thin films was not severely perturbed by the high doping levels studied in this work.</abstract><pub>American Chemical Society</pub><doi>10.1021/acs.jpcc.9b01668</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0001-8131-3313</orcidid><orcidid>https://orcid.org/0000-0001-9155-1657</orcidid><orcidid>https://orcid.org/0000-0002-1883-3508</orcidid></addata></record>
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title Mg-Doping of (111)B GaAs Thin Films Grown by Molecular Beam Epitaxy
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T17%3A46%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-acs_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Mg-Doping%20of%20(111)B%20GaAs%20Thin%20Films%20Grown%20by%20Molecular%20Beam%20Epitaxy&rft.jtitle=Journal%20of%20physical%20chemistry.%20C&rft.au=Limborc%CC%A7o,%20H&rft.date=2019-05-23&rft.volume=123&rft.issue=20&rft.spage=12807&rft.epage=12812&rft.pages=12807-12812&rft.issn=1932-7447&rft.eissn=1932-7455&rft_id=info:doi/10.1021/acs.jpcc.9b01668&rft_dat=%3Cacs_cross%3Ed236073980%3C/acs_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-a148t-fe99d53eaf7cdd38fc04122ffff6b76643e574c04fd7e7fa2aa1f40a4f5f43073%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true