Enhanced Endurance and Imprint Properties in Hf 0.5 Zr 0.5 O 2−δ Ferroelectric Capacitors by Tailoring the Oxygen Vacancy

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Bibliographic Details
Published in:ACS applied electronic materials 2023-08, Vol.5 (8), p.4615-4623
Main Authors: Bao, Keyu, Liao, Jiajia, Yan, Fei, Jia, Shijie, Zeng, Binjian, Yang, Qiong, Liao, Min, Zhou, Yichun
Format: Article
Language:English
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ISSN:2637-6113
2637-6113
DOI:10.1021/acsaelm.3c00756