Low-Temperature Deposition of Inorganic–Organic HfO 2 –PMMA Hybrid Gate Dielectric Layers for High-Mobility ZnO Thin-Film Transistors

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Published in:ACS applied electronic materials 2019-06, Vol.1 (6), p.1003-1011
Main Authors: Mullapudi, Gouri Syamala Rao, Velazquez-Nevarez, Gonzalo Alonso, Avila-Avendano, Carlos, Torres-Ochoa, Jorge Alejandro, Quevedo-López, Manuel Angel, Ramírez-Bon, Rafael
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doi_str_mv 10.1021/acsaelm.9b00175
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title Low-Temperature Deposition of Inorganic–Organic HfO 2 –PMMA Hybrid Gate Dielectric Layers for High-Mobility ZnO Thin-Film Transistors
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