Charge Density and pH Effects on Polycation Adsorption on Poly-Si, SiO 2 , and Si 3 N 4 Films and Impact on Removal During Chemical Mechanical Polishing

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Bibliographic Details
Published in:ACS applied materials & interfaces 2011-10, Vol.3 (10), p.4126-4132
Main Authors: Penta, Naresh K., Veera, P. R. Dandu, Babu, S. V.
Format: Article
Language:English
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ISSN:1944-8244
1944-8252
DOI:10.1021/am2010114