Charge Density and pH Effects on Polycation Adsorption on Poly-Si, SiO 2 , and Si 3 N 4 Films and Impact on Removal During Chemical Mechanical Polishing

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Published in:ACS applied materials & interfaces 2011-10, Vol.3 (10), p.4126-4132
Main Authors: Penta, Naresh K., Veera, P. R. Dandu, Babu, S. V.
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Language:English
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source American Chemical Society:Jisc Collections:American Chemical Society Read & Publish Agreement 2022-2024 (Reading list)
title Charge Density and pH Effects on Polycation Adsorption on Poly-Si, SiO 2 , and Si 3 N 4 Films and Impact on Removal During Chemical Mechanical Polishing
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