Pulsed Plasma Deposition of Super-Hydrophobic Nanospheres

Repetitive bursts of continuous wave plasma polymerization on the minute time scale are found to lead to the deposition of well-defined polymeric nanospheres. This unique mode of film growth is attributed to a high level of monomer replenishment in combination with minimal secondary reaction process...

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Bibliographic Details
Published in:Chemistry of materials 2002-11, Vol.14 (11), p.4566-4571
Main Authors: Teare, D. O. H, Spanos, C. G, Ridley, P, Kinmond, E. J, Roucoules, V, Badyal, J. P. S, Brewer, S. A, Coulson, S, Willis, C
Format: Article
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Physicochemistry of polymers
Polymerization
Polymers and radiations
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Summary:Repetitive bursts of continuous wave plasma polymerization on the minute time scale are found to lead to the deposition of well-defined polymeric nanospheres. This unique mode of film growth is attributed to a high level of monomer replenishment in combination with minimal secondary reaction processes (e.g., fragmentation, cross-linking, and etching). In the case of the 1H,1H,2H,2H-perfluorooctyl acrylate precursor, high contact angle (super-hydrophobic) surfaces are produced by this method.
ISSN:0897-4756
1520-5002
DOI:10.1021/cm011600f