Highly Selective Wet Etch for High-Resolution Three-Dimensional Nanostructures in Arsenic Sulfide All-Inorganic Photoresist

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Bibliographic Details
Published in:Chemistry of materials 2008-04, Vol.20 (7), p.2602-2602
Main Authors: Wong, Sean H, Thiel, Michael, Brodersen, Peter, Fenske, Dieter, Ozin, Geoffrey A, Wegener, Martin, von Freymann, Georg
Format: Article
Language:English
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ISSN:0897-4756
1520-5002
DOI:10.1021/cm800624g