Highly Selective Wet Etch for High-Resolution Three-Dimensional Nanostructures in Arsenic Sulfide All-Inorganic Photoresist

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Published in:Chemistry of materials 2008-04, Vol.20 (7), p.2602-2602
Main Authors: Wong, Sean H, Thiel, Michael, Brodersen, Peter, Fenske, Dieter, Ozin, Geoffrey A, Wegener, Martin, von Freymann, Georg
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Language:English
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container_end_page 2602
container_issue 7
container_start_page 2602
container_title Chemistry of materials
container_volume 20
creator Wong, Sean H
Thiel, Michael
Brodersen, Peter
Fenske, Dieter
Ozin, Geoffrey A
Wegener, Martin
von Freymann, Georg
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doi_str_mv 10.1021/cm800624g
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title Highly Selective Wet Etch for High-Resolution Three-Dimensional Nanostructures in Arsenic Sulfide All-Inorganic Photoresist
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