Photoetching of Thin Lead Films with Nitromethane

Saved in:
Bibliographic Details
Published in:Journal of physical chemistry (1952) 1964-01, Vol.68 (1), p.94-100
Main Author: Kaplan, L. H
Format: Article
Language:English
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-a303t-80144b1bbeaa5cc51c46cc11c8a6989bd76f500e51a52f002ec327c2ef5403f53
cites
container_end_page 100
container_issue 1
container_start_page 94
container_title Journal of physical chemistry (1952)
container_volume 68
creator Kaplan, L. H
description
doi_str_mv 10.1021/j100783a015
format article
fullrecord <record><control><sourceid>acs_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1021_j100783a015</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>b97774262</sourcerecordid><originalsourceid>FETCH-LOGICAL-a303t-80144b1bbeaa5cc51c46cc11c8a6989bd76f500e51a52f002ec327c2ef5403f53</originalsourceid><addsrcrecordid>eNptj8FOhDAURRujiTi68gfYuTDoe7QFZmlGBzVEJxFn4aYpnVbAAUxbo_69GIxx4erexcnNPYQcI5whxHjeIkCaUQnId0iAnGHEUwa7JACI44gmnO2TA-daAEBKMSC4qgc_aK_qpn8OBxOWYwkLLTfhstl2LnxvfB3eNd4Onfa17PUh2TNy6_TRT87I4_KqXFxHxX1-s7goIkmB-igDZKzCqtJScqU4KpYohagymcyzebVJE8MBNEfJYzPe04rGqYq14Qyo4XRGTqddZQfnrDbi1TadtJ8CQXzbij-2Ix1NdOO8_vhFpX0RSUpTLsrVg1g_5QlernNxO_InEy-VE-3wZvvR5d_lL6YzYVU</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Photoetching of Thin Lead Films with Nitromethane</title><source>American Chemical Society</source><creator>Kaplan, L. H</creator><creatorcontrib>Kaplan, L. H</creatorcontrib><identifier>ISSN: 0022-3654</identifier><identifier>EISSN: 1541-5740</identifier><identifier>DOI: 10.1021/j100783a015</identifier><language>eng</language><publisher>American Chemical Society</publisher><ispartof>Journal of physical chemistry (1952), 1964-01, Vol.68 (1), p.94-100</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a303t-80144b1bbeaa5cc51c46cc11c8a6989bd76f500e51a52f002ec327c2ef5403f53</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/j100783a015$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/j100783a015$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,780,784,27062,27922,27923,56764,56814</link.rule.ids></links><search><creatorcontrib>Kaplan, L. H</creatorcontrib><title>Photoetching of Thin Lead Films with Nitromethane</title><title>Journal of physical chemistry (1952)</title><addtitle>J. Phys. Chem</addtitle><issn>0022-3654</issn><issn>1541-5740</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1964</creationdate><recordtype>article</recordtype><recordid>eNptj8FOhDAURRujiTi68gfYuTDoe7QFZmlGBzVEJxFn4aYpnVbAAUxbo_69GIxx4erexcnNPYQcI5whxHjeIkCaUQnId0iAnGHEUwa7JACI44gmnO2TA-daAEBKMSC4qgc_aK_qpn8OBxOWYwkLLTfhstl2LnxvfB3eNd4Onfa17PUh2TNy6_TRT87I4_KqXFxHxX1-s7goIkmB-igDZKzCqtJScqU4KpYohagymcyzebVJE8MBNEfJYzPe04rGqYq14Qyo4XRGTqddZQfnrDbi1TadtJ8CQXzbij-2Ix1NdOO8_vhFpX0RSUpTLsrVg1g_5QlernNxO_InEy-VE-3wZvvR5d_lL6YzYVU</recordid><startdate>19640101</startdate><enddate>19640101</enddate><creator>Kaplan, L. H</creator><general>American Chemical Society</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19640101</creationdate><title>Photoetching of Thin Lead Films with Nitromethane</title><author>Kaplan, L. H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a303t-80144b1bbeaa5cc51c46cc11c8a6989bd76f500e51a52f002ec327c2ef5403f53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1964</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kaplan, L. H</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><jtitle>Journal of physical chemistry (1952)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kaplan, L. H</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Photoetching of Thin Lead Films with Nitromethane</atitle><jtitle>Journal of physical chemistry (1952)</jtitle><addtitle>J. Phys. Chem</addtitle><date>1964-01-01</date><risdate>1964</risdate><volume>68</volume><issue>1</issue><spage>94</spage><epage>100</epage><pages>94-100</pages><issn>0022-3654</issn><eissn>1541-5740</eissn><pub>American Chemical Society</pub><doi>10.1021/j100783a015</doi><tpages>7</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0022-3654
ispartof Journal of physical chemistry (1952), 1964-01, Vol.68 (1), p.94-100
issn 0022-3654
1541-5740
language eng
recordid cdi_crossref_primary_10_1021_j100783a015
source American Chemical Society
title Photoetching of Thin Lead Films with Nitromethane
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T12%3A58%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-acs_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Photoetching%20of%20Thin%20Lead%20Films%20with%20Nitromethane&rft.jtitle=Journal%20of%20physical%20chemistry%20(1952)&rft.au=Kaplan,%20L.%20H&rft.date=1964-01-01&rft.volume=68&rft.issue=1&rft.spage=94&rft.epage=100&rft.pages=94-100&rft.issn=0022-3654&rft.eissn=1541-5740&rft_id=info:doi/10.1021/j100783a015&rft_dat=%3Cacs_cross%3Eb97774262%3C/acs_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-a303t-80144b1bbeaa5cc51c46cc11c8a6989bd76f500e51a52f002ec327c2ef5403f53%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true