A single-source precursor to titanium nitride thin films. Evidence for the intermediacy of imido complexes in the chemical vapor deposition process

Saved in:
Bibliographic Details
Published in:Journal of the American Chemical Society 1992-01, Vol.114 (3), p.1095-1097
Main Authors: Winter, Charles H, Sheridan, Philip H, Lewkebandara, T. Suren, Heeg, Mary Jane, Proscia, James W
Format: Article
Language:English
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0002-7863
1520-5126
DOI:10.1021/ja00029a053