Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe

Soft X-ray scanning photoelectron microscopy (SPEM) was applied to image and characterize molecular patterns produced by electron irradiation of various aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs). The observed chemical contrasts allowed us to monitor complex phenomena whic...

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Bibliographic Details
Published in:The journal of physical chemistry. B 2003-11, Vol.107 (47), p.13133-13142
Main Authors: Klauser, Ruth, Hong, I.-H, Wang, S.-C, Zharnikov, M, Paul, A, Gölzhäuser, A, Terfort, A, Chuang, T. J
Format: Article
Language:English
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Summary:Soft X-ray scanning photoelectron microscopy (SPEM) was applied to image and characterize molecular patterns produced by electron irradiation of various aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs). The observed chemical contrasts allowed us to monitor complex phenomena which occurred as a result of electron-beam patterning, the exposure of the patterned films to ambient, and the irradiation of the films by the X-ray microprobe during image acquisition. The latter effect has been analyzed in detail and utilized for direct lithographic writing in the SAM resists by the zone-plate-focused X-ray beam. The results demonstrate the capabilities of the SPEM technique both for chemical imaging and as a fabrication tool for micro- and nanolithography.
ISSN:1520-6106
1520-5207
DOI:10.1021/jp0307396