Selective Dissociation of 4-Chloroaniline on the Si(111)-7×7 Surface through N−H Bond Breakage

The covalent attachment of 4-chloroaniline on the Si(111)-7×7 surface was investigated by using a combination of X-ray photoelectron spectroscopy (XPS), high-resolution electron energy loss spectroscopy (HREELS), and density functional theory (DFT) calculations. The HREELS spectra suggest that one o...

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Bibliographic Details
Published in:Journal of physical chemistry. C 2009-03, Vol.113 (10), p.4155-4160
Main Authors: Cai, Ying Hui, Shao, Yan Xia, Dong, Dong, Tang, Hai Hua, Wang, Shuai, Xu, Guo Qin
Format: Article
Language:English
Subjects:
C: Surfaces, Interfaces, Catalysis
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Summary:The covalent attachment of 4-chloroaniline on the Si(111)-7×7 surface was investigated by using a combination of X-ray photoelectron spectroscopy (XPS), high-resolution electron energy loss spectroscopy (HREELS), and density functional theory (DFT) calculations. The HREELS spectra suggest that one of the N−H bonds dissociates to form Si−N and Si−H bonds with the phenyl ring and the C−Cl bond unperturbed upon chemisorption. The XPS results confirm that only the NH2 group participates in the surface binding. This binding mode and surface reaction pathway are further supported by the DFT calculation. The resulting chlorobenene-like structure on Si(111)-7×7 can be employed for further photochemical modification and functionalization.
ISSN:1932-7447
1932-7455
DOI:10.1021/jp8096549