Interfacial Phase Stability in TiV Multilaminate Thin Films

The influence of the interfacial energy on the material phase stability is investigated for a series of TiV multilaminate thin films. Experiments reveal that at a higher layer thickness, the α (hcp) phase is the most stable. As the layer thickness is reduced, a transformation from the α (hcp) phase...

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Published in:Journal of physical chemistry. C 2009-12, Vol.113 (51), p.21383-21388
Main Authors: Stott, Amanda C, Abel, Phillip B, Bozzolo, Guillermo H, Dixon, David A
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Language:English
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C: Surfaces, Interfaces, Catalysis
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description The influence of the interfacial energy on the material phase stability is investigated for a series of TiV multilaminate thin films. Experiments reveal that at a higher layer thickness, the α (hcp) phase is the most stable. As the layer thickness is reduced, a transformation from the α (hcp) phase to the β (bcc) phase occurs. Atomic-scale characterization of the transformed specimen by atom probe tomography reveals V interfacial diffusion between the layers. Equivalent crystal theory based calculations confirm the V interfacial diffusion mechanism. The predicted segregation profiles match those obtained experimentally.
doi_str_mv 10.1021/jp907807k
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title Interfacial Phase Stability in TiV Multilaminate Thin Films
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