Substrate-Independent Lamellar Orientation in High-Molecular-Weight Polystyrene‑b‑poly(methyl methacrylate) Films: Neutral Solvent Vapor and Thermal Annealing Effect

Lamellar microdomain orientation in polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) films was controlled by a solvent vapor annealing process, where the high-molecular-weight block copolymer (BCP) was used to self-assemble in a large period of 105 nm. A neutral solvent annealing with tetrahydrof...

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Bibliographic Details
Published in:Macromolecules 2014-06, Vol.47 (12), p.3969-3977
Main Authors: Choi, Eunyoung, Park, Sungmin, Ahn, Hyungju, Lee, Moongyu, Bang, Joona, Lee, Byeongdu, Ryu, Du Yeol
Format: Article
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Organic polymers
Physicochemistry of polymers
Properties and characterization
Structure, morphology and analysis
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Summary:Lamellar microdomain orientation in polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) films was controlled by a solvent vapor annealing process, where the high-molecular-weight block copolymer (BCP) was used to self-assemble in a large period of 105 nm. A neutral solvent annealing with tetrahydrofuran vapor screened the difference in the surface energy between the two blocks and the interfacial interactions of the substrate with each block, leading to the substrate-independent perpendicular orientation of lamellar microdomains. Together with thermal annealing of the solvent-annealed BCP film, we demonstrate that highly ordered line arrays of perpendicularly oriented lamellae were well guided in topographic line and disk photoresist patterns composed of the PS-attractive cross-linked copolymer, where the interlamellar d-spacing compliant to the patterns was dependent on the confinement types.
ISSN:0024-9297
1520-5835
DOI:10.1021/ma500716f