2D-Confined Nanochannels Fabricated by Conventional Micromachining

Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial e...

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Published in:Nano letters 2002-09, Vol.2 (9), p.1031-1032
Main Authors: Tas, N. R, Berenschot, J. W, Mela, P, Jansen, H. V, Elwenspoek, M, van den Berg, A
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cited_by cdi_FETCH-LOGICAL-a257t-b0843ea636d88724bc95f46e8e9e0fc8160215ced24dd0af5f1e3c60669a88143
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creator Tas, N. R
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description Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs.
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