Direct Writing of Sub-5 nm Hafnium Diboride Metallic Nanostructures

Sub-5 nm metallic hafnium diboride (HfB2) nanostructures were directly written onto Si(100)-2 × 1:H surfaces using ultrahigh vacuum scanning tunneling microscope (UHV-STM) electron beam induced deposition (EBID) of a carbon-free precursor molecule, tetrakis(tetrahydroborato)hafnium, Hf(BH4)4. Scanni...

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Bibliographic Details
Published in:ACS nano 2010-11, Vol.4 (11), p.6818-6824
Main Authors: Ye, Wei, Peña Martin, Pamela A, Kumar, Navneet, Daly, Scott R, Rockett, Angus A, Abelson, John R, Girolami, Gregory S, Lyding, Joseph W
Format: Article
Language:English
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Summary:Sub-5 nm metallic hafnium diboride (HfB2) nanostructures were directly written onto Si(100)-2 × 1:H surfaces using ultrahigh vacuum scanning tunneling microscope (UHV-STM) electron beam induced deposition (EBID) of a carbon-free precursor molecule, tetrakis(tetrahydroborato)hafnium, Hf(BH4)4. Scanning tunneling spectroscopy data confirm the metallic nature of the HfB2 nanostructures, which have been written down to lateral dimensions of ∼2.5 nm. To our knowledge, this is the first demonstration of sub-5 nm metallic nanostructures in an STM-EBID experiment.
ISSN:1936-0851
1936-086X
DOI:10.1021/nn1018522