Li 2 CO 3 thin films fabricated by sputtering techniques: the role of temperature on their properties

The physical and electrochemical characterization of Li 2 CO 3 thin films allows for an improved understanding of their behaviour in electrochemical devices. Firstly, the Li 2 CO 3 deposition process by RF magnetron sputtering was described. Afterwards, X-ray diffraction (XRD), atomic force microsco...

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Published in:CrystEngComm 2014, Vol.16 (27), p.6033-6038
Main Authors: Rojo, Lander, Castro-Hurtado, Irene, Morant-Miñana, María C., Mandayo, Gemma G., Castaño, Enrique
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description The physical and electrochemical characterization of Li 2 CO 3 thin films allows for an improved understanding of their behaviour in electrochemical devices. Firstly, the Li 2 CO 3 deposition process by RF magnetron sputtering was described. Afterwards, X-ray diffraction (XRD), atomic force microscopy (AFM) and electrochemical impedance spectroscopy (EIS) characterization techniques were employed to study the influence of temperature on the material. This way, the optimal annealing temperature as well as the optimal operating temperature of Li 2 CO 3 were determined. In light of the obtained results, it was concluded that a fabrication annealing temperature of 600 °C and an optimal operating temperature of 350 °C were set.
doi_str_mv 10.1039/C4CE00476K
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title Li 2 CO 3 thin films fabricated by sputtering techniques: the role of temperature on their properties
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