Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes...

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Bibliographic Details
Published in:RSC advances 2015-01, Vol.5 (41), p.3234-3263
Main Authors: Vasilyev, V. Yu, Morozova, N. B, Basova, T. V, Igumenov, I. K, Hassan, A
Format: Article
Language:English
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Summary:Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes and mechanisms as well as the main structure, composition and properties of iridium-containing thin films are analyzed, and modern thin film application examples are outlined. Numerical characterization of iridium-based thin film growth in 3D objects is presented. Iridium-based film precursor chemistry, nucleation and growth at CVD/ALD are reviewed with numerical characterization of the growth features in 3D objects.
ISSN:2046-2069
2046-2069
DOI:10.1039/c5ra03566j