Polystyrene microspheres with ultra-rough surfaces engineered using RIE technique and applied using SERS

In this study, we successfully fabricated two ultra-rough surfaces based on polystyrene (PS) microspheres by employing the reactive ion etching (RIE) technique. Elemental analysis confirmed a stable AlF 3 composition of the structures of these surfaces. We proposed the mechanism of the formation of...

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Bibliographic Details
Published in:Chemical communications (Cambridge, England) England), 2024-02, Vol.6 (18), p.2493-2496
Main Authors: Song, Jizhe, Feng, Sujuan, Shi, Haonan, Han, Daotong, Liu, Guangqiang
Format: Article
Language:English
Subjects:
Aluminum fluorides
Microspheres
Polystyrene resins
Reactive ion etching
Substrates
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Summary:In this study, we successfully fabricated two ultra-rough surfaces based on polystyrene (PS) microspheres by employing the reactive ion etching (RIE) technique. Elemental analysis confirmed a stable AlF 3 composition of the structures of these surfaces. We proposed the mechanism of the formation of these surfaces and performed SERS-related tests; the prepared substrates exhibited excellent SERS performance. Two ultra-rough structures were constructed on the surfaces of relatively large PS microspheres using reactive ion etching, elucidating their formation mechanism and testing their SERS properties.
ISSN:1359-7345
1364-548X
DOI:10.1039/d3cc05940e