Construction of stable Cu + /Cu 0 sites at the fullerene/Cu(OH)F interface to boost the electroreduction of CO 2 to C 2+ products

Herein, the reduction of the Cu oxidation state during the CO electro-reduction reaction (CO RR) is effectively inhibited by depositing C supramolecular clusters onto the Cu(OH)F surface. By utilizing the unique electronic buffering capacity of C , a significant number of Cu /Cu sites are created, l...

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Published in:Chemical communications (Cambridge, England) England), 2025-01, Vol.61 (8), p.1681-1684
Main Authors: Xiong, Xiao-Wan, Wu, Xin-Yue, Cheng, Yuan-Sheng, Yu, Delei, Xu, Xu-Dong, Cheng, Yuwen, Wu, Fang-Hui, Wei, Xian-Wen
Format: Article
Language:English
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Summary:Herein, the reduction of the Cu oxidation state during the CO electro-reduction reaction (CO RR) is effectively inhibited by depositing C supramolecular clusters onto the Cu(OH)F surface. By utilizing the unique electronic buffering capacity of C , a significant number of Cu /Cu sites are created, leading to a remarkable faradaic efficiency of C products up to 76.9% and exceptional stability.
ISSN:1359-7345
1364-548X
DOI:10.1039/d4cc03987d