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Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors

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Bibliographic Details
Published in:	Journal of materials chemistry 2005-01, Vol.15 (19), p.1896-1902
Main Authors:	YIM FUN LOO, O'KANE, Ruairi, JONES, Anthony C, ASPINALL, Helen C, POTTER, Richard J, CHALKER, Paul R, BICKLEY, Jamie F, TAYLOR, Stephen, SMITH, Lesley M
Format:	Article
Language:	English
Subjects:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
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