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Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors

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Published in:	Journal of materials chemistry 2005-01, Vol.15 (19), p.1896-1902
Main Authors:	YIM FUN LOO, O'KANE, Ruairi, JONES, Anthony C, ASPINALL, Helen C, POTTER, Richard J, CHALKER, Paul R, BICKLEY, Jamie F, TAYLOR, Stephen, SMITH, Lesley M
Format:	Article
Language:	English
Subjects:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
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cited_by	cdi_FETCH-LOGICAL-c323t-38f0a83edbdbeec671af6a186b39f02b76f68a223454b547e2e24d415da28b203
cites	cdi_FETCH-LOGICAL-c323t-38f0a83edbdbeec671af6a186b39f02b76f68a223454b547e2e24d415da28b203
container_end_page	1902
container_issue	19
container_start_page	1896
container_title	Journal of materials chemistry
container_volume	15
creator	YIM FUN LOO O'KANE, Ruairi JONES, Anthony C ASPINALL, Helen C POTTER, Richard J CHALKER, Paul R BICKLEY, Jamie F TAYLOR, Stephen SMITH, Lesley M
description
doi_str_mv	10.1039/b417389a
format	article
fullrecord	<record><control><sourceid>pascalfrancis_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1039_b417389a</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>16806591</sourcerecordid><originalsourceid>FETCH-LOGICAL-c323t-38f0a83edbdbeec671af6a186b39f02b76f68a223454b547e2e24d415da28b203</originalsourceid><addsrcrecordid>eNpF0EtLAzEABOAgCtYq-BNyEbys5r3JUVprhUov6sHLkqek7m7WpEX7761W8TRz-JjDAHCO0RVGVF0bhmsqlT4AI0wFqzhH-BCMkOKqUozIY3BSygohjGvBR8BO_ZBKXMfUwxTgPCwJ1L2DL3lXQmy7As0WtvF9Ex2M_crbH_qwnDxP4abE_hX2_gN2qU-dz9FC3b6lz-g8HLK3m1xSLqfgKOi2-LPfHIOn2e3jZF4tlnf3k5tFZSmh64rKgLSk3hlnvLeixjoIjaUwVAVETC2CkJoQyjgznNWeeMIcw9xpIg1BdAwu97s2p1KyD82QY6fztsGo-T6n-TtnRy_2dNDF6jZk3dtY_r2QSHCF6Rf1dWQn</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors</title><source>Royal Society of Chemistry: Jisc Collections: Journals Archive 1841-2007 (2019-2023)</source><creator>YIM FUN LOO ; O'KANE, Ruairi ; JONES, Anthony C ; ASPINALL, Helen C ; POTTER, Richard J ; CHALKER, Paul R ; BICKLEY, Jamie F ; TAYLOR, Stephen ; SMITH, Lesley M</creator><creatorcontrib>YIM FUN LOO ; O'KANE, Ruairi ; JONES, Anthony C ; ASPINALL, Helen C ; POTTER, Richard J ; CHALKER, Paul R ; BICKLEY, Jamie F ; TAYLOR, Stephen ; SMITH, Lesley M</creatorcontrib><identifier>ISSN: 0959-9428</identifier><identifier>EISSN: 1364-5501</identifier><identifier>DOI: 10.1039/b417389a</identifier><language>eng</language><publisher>Cambridge: Royal Society of Chemistry</publisher><subject>Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics</subject><ispartof>Journal of materials chemistry, 2005-01, Vol.15 (19), p.1896-1902</ispartof><rights>2006 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c323t-38f0a83edbdbeec671af6a186b39f02b76f68a223454b547e2e24d415da28b203</citedby><cites>FETCH-LOGICAL-c323t-38f0a83edbdbeec671af6a186b39f02b76f68a223454b547e2e24d415da28b203</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=16806591$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>YIM FUN LOO</creatorcontrib><creatorcontrib>O'KANE, Ruairi</creatorcontrib><creatorcontrib>JONES, Anthony C</creatorcontrib><creatorcontrib>ASPINALL, Helen C</creatorcontrib><creatorcontrib>POTTER, Richard J</creatorcontrib><creatorcontrib>CHALKER, Paul R</creatorcontrib><creatorcontrib>BICKLEY, Jamie F</creatorcontrib><creatorcontrib>TAYLOR, Stephen</creatorcontrib><creatorcontrib>SMITH, Lesley M</creatorcontrib><title>Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors</title><title>Journal of materials chemistry</title><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><issn>0959-9428</issn><issn>1364-5501</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNpF0EtLAzEABOAgCtYq-BNyEbys5r3JUVprhUov6sHLkqek7m7WpEX7761W8TRz-JjDAHCO0RVGVF0bhmsqlT4AI0wFqzhH-BCMkOKqUozIY3BSygohjGvBR8BO_ZBKXMfUwxTgPCwJ1L2DL3lXQmy7As0WtvF9Ex2M_crbH_qwnDxP4abE_hX2_gN2qU-dz9FC3b6lz-g8HLK3m1xSLqfgKOi2-LPfHIOn2e3jZF4tlnf3k5tFZSmh64rKgLSk3hlnvLeixjoIjaUwVAVETC2CkJoQyjgznNWeeMIcw9xpIg1BdAwu97s2p1KyD82QY6fztsGo-T6n-TtnRy_2dNDF6jZk3dtY_r2QSHCF6Rf1dWQn</recordid><startdate>20050101</startdate><enddate>20050101</enddate><creator>YIM FUN LOO</creator><creator>O'KANE, Ruairi</creator><creator>JONES, Anthony C</creator><creator>ASPINALL, Helen C</creator><creator>POTTER, Richard J</creator><creator>CHALKER, Paul R</creator><creator>BICKLEY, Jamie F</creator><creator>TAYLOR, Stephen</creator><creator>SMITH, Lesley M</creator><general>Royal Society of Chemistry</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20050101</creationdate><title>Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors</title><author>YIM FUN LOO ; O'KANE, Ruairi ; JONES, Anthony C ; ASPINALL, Helen C ; POTTER, Richard J ; CHALKER, Paul R ; BICKLEY, Jamie F ; TAYLOR, Stephen ; SMITH, Lesley M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c323t-38f0a83edbdbeec671af6a186b39f02b76f68a223454b547e2e24d415da28b203</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>YIM FUN LOO</creatorcontrib><creatorcontrib>O'KANE, Ruairi</creatorcontrib><creatorcontrib>JONES, Anthony C</creatorcontrib><creatorcontrib>ASPINALL, Helen C</creatorcontrib><creatorcontrib>POTTER, Richard J</creatorcontrib><creatorcontrib>CHALKER, Paul R</creatorcontrib><creatorcontrib>BICKLEY, Jamie F</creatorcontrib><creatorcontrib>TAYLOR, Stephen</creatorcontrib><creatorcontrib>SMITH, Lesley M</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of materials chemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>YIM FUN LOO</au><au>O'KANE, Ruairi</au><au>JONES, Anthony C</au><au>ASPINALL, Helen C</au><au>POTTER, Richard J</au><au>CHALKER, Paul R</au><au>BICKLEY, Jamie F</au><au>TAYLOR, Stephen</au><au>SMITH, Lesley M</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors</atitle><jtitle>Journal of materials chemistry</jtitle><date>2005-01-01</date><risdate>2005</risdate><volume>15</volume><issue>19</issue><spage>1896</spage><epage>1902</epage><pages>1896-1902</pages><issn>0959-9428</issn><eissn>1364-5501</eissn><cop>Cambridge</cop><pub>Royal Society of Chemistry</pub><doi>10.1039/b417389a</doi><tpages>7</tpages></addata></record>
fulltext	fulltext
identifier	ISSN: 0959-9428
ispartof	Journal of materials chemistry, 2005-01, Vol.15 (19), p.1896-1902
issn	0959-9428 1364-5501
language	eng
recordid	cdi_crossref_primary_10_1039_b417389a
source	Royal Society of Chemistry: Jisc Collections: Journals Archive 1841-2007 (2019-2023)
subjects	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
title	Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors
url	http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T00%3A44%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Deposition%20of%20HfO2%20and%20ZrO2%20films%20by%20liquid%20injection%20MOCVD%20using%20new%20monomeric%20alkoxide%20precursors&rft.jtitle=Journal%20of%20materials%20chemistry&rft.au=YIM%20FUN%20LOO&rft.date=2005-01-01&rft.volume=15&rft.issue=19&rft.spage=1896&rft.epage=1902&rft.pages=1896-1902&rft.issn=0959-9428&rft.eissn=1364-5501&rft_id=info:doi/10.1039/b417389a&rft_dat=%3Cpascalfrancis_cross%3E16806591%3C/pascalfrancis_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c323t-38f0a83edbdbeec671af6a186b39f02b76f68a223454b547e2e24d415da28b203%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true