Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography

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Bibliographic Details
Published in:Journal of materials chemistry 2012-11, Vol.22 (42), p.22678
Main Authors: Geng, Chong, Zheng, Lu, Yu, Jie, Yan, Qingfeng, Wei, Tongbo, Wang, Xiaoqing, Shen, Dezhong
Format: Article
Language:English
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ISSN:0959-9428
1364-5501
DOI:10.1039/c2jm33660j