Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography

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Published in:Journal of materials chemistry 2012-11, Vol.22 (42), p.22678
Main Authors: Geng, Chong, Zheng, Lu, Yu, Jie, Yan, Qingfeng, Wei, Tongbo, Wang, Xiaoqing, Shen, Dezhong
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Language:English
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container_issue 42
container_start_page 22678
container_title Journal of materials chemistry
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creator Geng, Chong
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Yu, Jie
Yan, Qingfeng
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description
doi_str_mv 10.1039/c2jm33660j
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title Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography
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