New x-ray source for lithography

We propose the use of electromagnetic waves as an undulator in order to generate x rays in the wavelength range required for fabrication of integrated circuits. The configuration consists of a quasi-optical maser cavity through which a beam of relativistic electrons is made to propagate, spontaneous...

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Bibliographic Details
Published in:Applied physics letters 1989-12, Vol.55 (24), p.2559-2560
Main Authors: SPRANGLE, P, HAFIZI, B, MAKO, F
Format: Article
Language:English
Subjects:
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Physics
X- and γ-ray instruments and techniques
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Summary:We propose the use of electromagnetic waves as an undulator in order to generate x rays in the wavelength range required for fabrication of integrated circuits. The configuration consists of a quasi-optical maser cavity through which a beam of relativistic electrons is made to propagate, spontaneously emitting x rays of the desired energy. The scaling of the x-ray power with wavelength indicates that the throughput can be increased by using resists which are sensitive to shorter wavelength x rays.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.101981