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Molecular beam epitaxy of ZnSe1− x Te x ternary alloys
ZnSe1−xTex ternary alloy has been grown over the entire range of composition by molecular beam epitaxy on GaAs and InP substrates. A precise control of the composition is achieved by growing this material under Zn-rich conditions. For low Te concentrations, However, significant Te surface segregatio...
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Published in: | Applied physics letters 1991-04, Vol.58 (15), p.1611-1613 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | ZnSe1−xTex ternary alloy has been grown over the entire range of composition by molecular beam epitaxy on GaAs and InP substrates. A precise control of the composition is achieved by growing this material under Zn-rich conditions. For low Te concentrations, However, significant Te surface segregation is observed, which may be due to surface energy minimization. The band-gap energy has been measured over the entire range of composition and presents a very strong bowing with a minimum energy of 2.05 eV for a Te concentration of 0.65. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.105141 |