Electrical resistance of electron beam induced deposits from tungsten hexacarbonyl

We studied the change in electrical conductivity of deposits from focused electron beam induced dissociation of W(CO)6 for different exposure conditions. Lines were deposited by scanning repeatedly to build up the same total electron dose; with different electron doses per scan, resistance differenc...

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Bibliographic Details
Published in:Applied physics letters 1993-06, Vol.62 (23), p.3043-3045
Main Authors: HOYLE, P. C, OGASAWARA, M, CLEAVER, J. R. A, AHMED, H
Format: Article
Language:English
Subjects:
Applied sciences
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Electronic transport phenomena in thin films and low-dimensional structures
Exact sciences and technology
Metals. Metallurgy
Physics
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Summary:We studied the change in electrical conductivity of deposits from focused electron beam induced dissociation of W(CO)6 for different exposure conditions. Lines were deposited by scanning repeatedly to build up the same total electron dose; with different electron doses per scan, resistance differences of more than one order of magnitude resulted. The lines with lower deposited thicknesses also have lower resistances, and so cannot be explained in terms of constant resistivity and different cross-sectional areas. A theoretical description involving an intermediate and a final product is proposed and compared to the experimental results.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.109133