Design and fabrication of asymmetric strained layer mirrors for optoelectronic applications

The design of thin-film mirrors is optimized for strained layer materials systems. It is shown that the use of asymmetric structures produces only minor loss in reflectivity per mirror period, while greatly extending the number of periods that can be grown in a defect-free mode. As applied to the Ge...

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Bibliographic Details
Published in:Applied physics letters 1993-07, Vol.63 (4), p.444-446
Main Authors: BEAN, J. C, PETICOLAS, L. J, HULL, R, WINDT, D. L, KUCHIBHOTLA, R, CAMPBELL, J. C
Format: Article
Language:English
Subjects:
Bolometer
infrared, submillimeter wave, microwave and radiowave receivers and detectors
Exact sciences and technology
Infrared, submillimeter wave, microwave and radiowave instruments, equipment and techniques
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Physics
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Summary:The design of thin-film mirrors is optimized for strained layer materials systems. It is shown that the use of asymmetric structures produces only minor loss in reflectivity per mirror period, while greatly extending the number of periods that can be grown in a defect-free mode. As applied to the GexSi1−x/Si strained layer system, the net result is an enhancement of reflectivity, with 1.3 μm mirrors achieving peak values near 75%. The approach is applicable to other materials systems and should yield even higher reflectivities in situations where wider ranges in index of refraction are available.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.110018