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Microwave performance of a 0.25 μm gate AlGaN/GaN heterostructure field effect transistor
We fabricated a 0.25 μm gate length AlGaN/GaN heterostructure field effect transistor (HFET) with a maximum extrinsic transconductance of 27 mS/mm (at room temperature) limited by the source series resistance. The device exhibited an excellent pinch-off and a low parasitic output conductance in the...
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Published in: | Applied physics letters 1994-08, Vol.65 (9), p.1121-1123 |
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Language: | English |
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container_issue | 9 |
container_start_page | 1121 |
container_title | Applied physics letters |
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creator | Asif Khan, M. Kuznia, J. N. Olson, D. T. Schaff, W. J. Burm, J. W. Shur, M. S. |
description | We fabricated a 0.25 μm gate length AlGaN/GaN heterostructure field effect transistor (HFET) with a maximum extrinsic transconductance of 27 mS/mm (at room temperature) limited by the source series resistance. The device exhibited an excellent pinch-off and a low parasitic output conductance in the saturation regime. We measured the cutoff frequency fT and the maximum oscillation frequency fmax as 11 and 35 GHz, respectively. These values are superior to the highest reported values for field effect transistors based on other wide band-gap semiconductors such as SiC. These results demonstrate an excellent potential of AlGaN/GaN HFETs for microwave and millimeter wave applications. |
doi_str_mv | 10.1063/1.112116 |
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fullrecord | <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_112116</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_112116</sourcerecordid><originalsourceid>FETCH-LOGICAL-c225t-26a40ed2d19497ba6523cd4af2d43b0ab911ec002a0461fdc8ba962ce30399083</originalsourceid><addsrcrecordid>eNotkMFOwzAQRC0EEqUg8Qk-ckm6aydOfKwqKEgFLnDhEm2cNQS1TWW7IP6Nb-CbCCqH0Wguo5knxCVCjmD0DHNEhWiOxAShqjKNWB-LCQDozNgST8VZjO9jLJXWE_Fy37swfNIHyx0HP4QNbR3LwUuSkKtS_nxv5CsllvP1kh5mo-QbJw5DTGHv0j6w9D2vO8nes0syBdrGPqYhnIsTT-vIF_8-Fc8310-L22z1uLxbzFeZU6pMmTJUAHeqQ1vYqiUzDnNdQV51hW6BWovIDkARFAZ95-qWrFGONWhrodZTcXXoHY_EGNg3u9BvKHw1CM0fkwabAxP9C4CWU34</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Microwave performance of a 0.25 μm gate AlGaN/GaN heterostructure field effect transistor</title><source>AIP Digital Archive</source><creator>Asif Khan, M. ; Kuznia, J. N. ; Olson, D. T. ; Schaff, W. J. ; Burm, J. W. ; Shur, M. S.</creator><creatorcontrib>Asif Khan, M. ; Kuznia, J. N. ; Olson, D. T. ; Schaff, W. J. ; Burm, J. W. ; Shur, M. S.</creatorcontrib><description>We fabricated a 0.25 μm gate length AlGaN/GaN heterostructure field effect transistor (HFET) with a maximum extrinsic transconductance of 27 mS/mm (at room temperature) limited by the source series resistance. The device exhibited an excellent pinch-off and a low parasitic output conductance in the saturation regime. We measured the cutoff frequency fT and the maximum oscillation frequency fmax as 11 and 35 GHz, respectively. These values are superior to the highest reported values for field effect transistors based on other wide band-gap semiconductors such as SiC. These results demonstrate an excellent potential of AlGaN/GaN HFETs for microwave and millimeter wave applications.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.112116</identifier><language>eng</language><ispartof>Applied physics letters, 1994-08, Vol.65 (9), p.1121-1123</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c225t-26a40ed2d19497ba6523cd4af2d43b0ab911ec002a0461fdc8ba962ce30399083</citedby><cites>FETCH-LOGICAL-c225t-26a40ed2d19497ba6523cd4af2d43b0ab911ec002a0461fdc8ba962ce30399083</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Asif Khan, M.</creatorcontrib><creatorcontrib>Kuznia, J. N.</creatorcontrib><creatorcontrib>Olson, D. T.</creatorcontrib><creatorcontrib>Schaff, W. J.</creatorcontrib><creatorcontrib>Burm, J. W.</creatorcontrib><creatorcontrib>Shur, M. S.</creatorcontrib><title>Microwave performance of a 0.25 μm gate AlGaN/GaN heterostructure field effect transistor</title><title>Applied physics letters</title><description>We fabricated a 0.25 μm gate length AlGaN/GaN heterostructure field effect transistor (HFET) with a maximum extrinsic transconductance of 27 mS/mm (at room temperature) limited by the source series resistance. The device exhibited an excellent pinch-off and a low parasitic output conductance in the saturation regime. We measured the cutoff frequency fT and the maximum oscillation frequency fmax as 11 and 35 GHz, respectively. These values are superior to the highest reported values for field effect transistors based on other wide band-gap semiconductors such as SiC. These results demonstrate an excellent potential of AlGaN/GaN HFETs for microwave and millimeter wave applications.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1994</creationdate><recordtype>article</recordtype><recordid>eNotkMFOwzAQRC0EEqUg8Qk-ckm6aydOfKwqKEgFLnDhEm2cNQS1TWW7IP6Nb-CbCCqH0Wguo5knxCVCjmD0DHNEhWiOxAShqjKNWB-LCQDozNgST8VZjO9jLJXWE_Fy37swfNIHyx0HP4QNbR3LwUuSkKtS_nxv5CsllvP1kh5mo-QbJw5DTGHv0j6w9D2vO8nes0syBdrGPqYhnIsTT-vIF_8-Fc8310-L22z1uLxbzFeZU6pMmTJUAHeqQ1vYqiUzDnNdQV51hW6BWovIDkARFAZ95-qWrFGONWhrodZTcXXoHY_EGNg3u9BvKHw1CM0fkwabAxP9C4CWU34</recordid><startdate>19940829</startdate><enddate>19940829</enddate><creator>Asif Khan, M.</creator><creator>Kuznia, J. N.</creator><creator>Olson, D. T.</creator><creator>Schaff, W. J.</creator><creator>Burm, J. W.</creator><creator>Shur, M. S.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19940829</creationdate><title>Microwave performance of a 0.25 μm gate AlGaN/GaN heterostructure field effect transistor</title><author>Asif Khan, M. ; Kuznia, J. N. ; Olson, D. T. ; Schaff, W. J. ; Burm, J. W. ; Shur, M. S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c225t-26a40ed2d19497ba6523cd4af2d43b0ab911ec002a0461fdc8ba962ce30399083</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1994</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Asif Khan, M.</creatorcontrib><creatorcontrib>Kuznia, J. N.</creatorcontrib><creatorcontrib>Olson, D. T.</creatorcontrib><creatorcontrib>Schaff, W. J.</creatorcontrib><creatorcontrib>Burm, J. W.</creatorcontrib><creatorcontrib>Shur, M. S.</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Asif Khan, M.</au><au>Kuznia, J. N.</au><au>Olson, D. T.</au><au>Schaff, W. J.</au><au>Burm, J. W.</au><au>Shur, M. S.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Microwave performance of a 0.25 μm gate AlGaN/GaN heterostructure field effect transistor</atitle><jtitle>Applied physics letters</jtitle><date>1994-08-29</date><risdate>1994</risdate><volume>65</volume><issue>9</issue><spage>1121</spage><epage>1123</epage><pages>1121-1123</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>We fabricated a 0.25 μm gate length AlGaN/GaN heterostructure field effect transistor (HFET) with a maximum extrinsic transconductance of 27 mS/mm (at room temperature) limited by the source series resistance. The device exhibited an excellent pinch-off and a low parasitic output conductance in the saturation regime. We measured the cutoff frequency fT and the maximum oscillation frequency fmax as 11 and 35 GHz, respectively. These values are superior to the highest reported values for field effect transistors based on other wide band-gap semiconductors such as SiC. These results demonstrate an excellent potential of AlGaN/GaN HFETs for microwave and millimeter wave applications.</abstract><doi>10.1063/1.112116</doi><tpages>3</tpages></addata></record> |
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title | Microwave performance of a 0.25 μm gate AlGaN/GaN heterostructure field effect transistor |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T02%3A51%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Microwave%20performance%20of%20a%200.25%20%CE%BCm%20gate%20AlGaN/GaN%20heterostructure%20field%20effect%20transistor&rft.jtitle=Applied%20physics%20letters&rft.au=Asif%20Khan,%20M.&rft.date=1994-08-29&rft.volume=65&rft.issue=9&rft.spage=1121&rft.epage=1123&rft.pages=1121-1123&rft.issn=0003-6951&rft.eissn=1077-3118&rft_id=info:doi/10.1063/1.112116&rft_dat=%3Ccrossref%3E10_1063_1_112116%3C/crossref%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c225t-26a40ed2d19497ba6523cd4af2d43b0ab911ec002a0461fdc8ba962ce30399083%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |