A plasma window for vacuum–atmosphere interface and focusing lens of sources for nonvacuum ion material modification (invited)

Material modifications by ion implantation, dry etching, and microfabrication are widely used technologies, all of which are performed in vacuum, since ion beams at energies used in these applications are completely attenuated by foils or by long differentially pumped sections, which are currently u...

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Bibliographic Details
Published in:Review of Scientific Instruments 1998-02, Vol.69 (2), p.868-873
Main Author: Hershcovitch, Ady
Format: Article
Language:English
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Summary:Material modifications by ion implantation, dry etching, and microfabrication are widely used technologies, all of which are performed in vacuum, since ion beams at energies used in these applications are completely attenuated by foils or by long differentially pumped sections, which are currently used to interface between vacuum and atmosphere. A novel plasma window, which utilizes a short arc for vacuum–atmosphere interface, has been developed. This window provides for sufficient vacuum atmosphere separation, as well as for ion beam propagation through it, thus facilitating nonvacuum ion material modification.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.1148468