Multicusp sources for ion beam projection lithography

Multicusp ion sources are capable of producing positive and negative ions with good beam quality and low energy spread. The ion energy spread of multicusp sources has been measured by three different techniques. The axial ion energy spread has been reduced by introducing a magnetic filter inside the...

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Bibliographic Details
Published in:Review of Scientific Instruments 1998-02, Vol.69 (2), p.877-879
Main Authors: Lee, Y., Gough, R. A., Kunkel, W. B., Leung, K. N., Vujic, J., Williams, M. D., Wutte, D., Zahir, N.
Format: Article
Language:English
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Summary:Multicusp ion sources are capable of producing positive and negative ions with good beam quality and low energy spread. The ion energy spread of multicusp sources has been measured by three different techniques. The axial ion energy spread has been reduced by introducing a magnetic filter inside the multicusp source chamber which adjusts the plasma potential distribution. The axial energy spread is further reduced by optimizing the source configuration. Values as low as 0.8 eV have been achieved.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.1148469