Interface inequivalence of the InP/InAlAs/InP staggered double heterostructure grown by metalorganic chemical vapor deposition

The optical and structural properties of the normal InAlAs on InP and the inverted InP on the InAlAs staggered band lineup interface grown by metalorganic chemical vapor deposition (MOCVD) are compared by use of transmission electron microscopy (TEM), time integrated, and time resolved photoluminesc...

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Published in:Applied physics letters 1996-02, Vol.68 (8), p.1072-1074
Main Authors: Böhrer, J., Krost, A., Heitz, R., Heinrichsdorff, F., Eckey, L., Bimberg, D., Cerva, H.
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container_end_page 1074
container_issue 8
container_start_page 1072
container_title Applied physics letters
container_volume 68
creator Böhrer, J.
Krost, A.
Heitz, R.
Heinrichsdorff, F.
Eckey, L.
Bimberg, D.
Cerva, H.
description The optical and structural properties of the normal InAlAs on InP and the inverted InP on the InAlAs staggered band lineup interface grown by metalorganic chemical vapor deposition (MOCVD) are compared by use of transmission electron microscopy (TEM), time integrated, and time resolved photoluminescence. TEM images show that both interfaces are dissimilar. The normal interface is very abrupt. The inverted interface shows an additional graded layer of about 2.5 nm in width of In1−xAlxAsyP1−y with x (0.48–0) and y (1.0–0.0). A large optical anisotropy exists because of the inequivalence of the two interfaces. The larger spatial separation of the carriers at the inverted interface is responsible for a smaller overlap of the electron and hole wave functions and for that reason a one order of magnitude longer e-h luminescence decay time of 45 ns is observed. The normal interface transition shifts approximately to the third root of excitation while the inverted interface transition shifts logarithmically.
doi_str_mv 10.1063/1.115716
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title Interface inequivalence of the InP/InAlAs/InP staggered double heterostructure grown by metalorganic chemical vapor deposition
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