Direct writing of GaAs optical waveguides by laser-assisted chemical vapor deposition

We demonstrate the direct writing of GaAs waveguide structures by selective area deposition using laser-assisted chemical vapor deposition (LCVD). The multimode waveguides have a Gaussian shape and a very smooth surface, and they exhibit losses as low as 5.4 dB/cm. The LCVD technique offers the capa...

Full description

Saved in:
Bibliographic Details
Published in:Applied physics letters 1996-04, Vol.68 (15), p.2041-2042
Main Authors: Boutros, K. S., Roberts, J. C., Bedair, S. M.
Format: Article
Language:English
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We demonstrate the direct writing of GaAs waveguide structures by selective area deposition using laser-assisted chemical vapor deposition (LCVD). The multimode waveguides have a Gaussian shape and a very smooth surface, and they exhibit losses as low as 5.4 dB/cm. The LCVD technique offers the capability of selective growth of independent device structures, and hence the capability of monolithic integration of these devices for optoelectronic applications.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.116296