Inductively coupled plasma etching of GaN

Inductively coupled plasma (ICP) etch rates for GaN are reported as a function of plasma pressure, plasma chemistry, rf power, and ICP power. Using a Cl2/H2/Ar plasma chemistry, GaN etch rates as high as 6875 Å/min are reported. The GaN surface morphology remains smooth over a wide range of plasma c...

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Bibliographic Details
Published in:Applied physics letters 1996-08, Vol.69 (8), p.1119-1121
Main Authors: Shul, R. J., McClellan, G. B., Casalnuovo, S. A., Rieger, D. J., Pearton, S. J., Constantine, C., Barratt, C., Karlicek, R. F., Tran, C., Schurman, M.
Format: Article
Language:English
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Summary:Inductively coupled plasma (ICP) etch rates for GaN are reported as a function of plasma pressure, plasma chemistry, rf power, and ICP power. Using a Cl2/H2/Ar plasma chemistry, GaN etch rates as high as 6875 Å/min are reported. The GaN surface morphology remains smooth over a wide range of plasma conditions as quantified using atomic force microscopy. Several etch conditions yield highly anisotropic profiles with smooth sidewalls. These results have direct application to the fabrication of group-III nitride etched laser facets.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.117077